Zero Fee Event, Registration Mandatory

Merilkon in partnership with PatSeer

IP Next 2025, Oslo

AI in Everyday Patent Work 

Practical insights for the future of patents

Date: Thursday, 9th October, 2025

Time: 09:30–15:00 

Venue: Tollgaarden, Schweigaards gate 15, 0191 Oslo, Norway

Admission: Free of charge, lunch included

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The world of patents is evolving quickly, and staying ahead means understanding how new approaches are shaping everyday work. IP Next 2025 in Oslo brings together leading experts, practitioners, and innovators to share practical insights you can apply directly to your patent practice. 

At this event you will: 

  • Learn how emerging tools and methods are transforming patent search, examination, and management 
  • Hear real-world experiences from professionals who are using new technologies in their daily work 
  • Gain forward-looking perspectives on the future of patents in Norway and beyond 
  • Connect with peers and industry leaders in an interactive and collaborative setting 

This is a unique opportunity to discover smarter ways of working and prepare for the future of patents. 

Topic: Practical approaches to everyday patent work 

Theme: Real experiences and future outlook in patent practice

Agenda:

Time Session Title / Activity Presenter(s)
09:30 – 10:30 The Role of AI in Patent Work Henrik Aurell
10:40 – 11:20 How to work with new tech to improve the patent work Ari Hirvonen
11:30 – 12:30 Lunch and networking
12:40 – 13:40 The Latest AI-Driven IP Developments: PatSeer’s IP8 for Patent Infringement Detection and Intelligence Manish Sinha
13:50 – 14:50 How AI affects a patent examiner, present and future outlook Fredrik Lundvall

Speakers

Manish Sinha

Founder & CTO, PatSeer Technologies (India)

Ari Hirvonen

Head of IP, Outokumpu Corporation (Finland)

Henrik Aurell 

Partner AI/IP, AWA (Sweden)

Fredrik Lundvall

Senior Examiner, Patentstyret – Norwegian Industrial Property Office (NIPO) (Norway)

Venue

Main Venue: Tollgaarden, Schweigaards gate 15, 0191 Oslo, Norway

*Due to high demand and limited seating, early registration is recommended

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